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Investigations into the impact of various substrates and ZnO ultra thin seed layers prepared by atomic layer deposition on growth of ZnO nanowire array

JN Ding12, YB Liu12, CB Tan12 and NY Yuan12*

Author affiliations

1 Center for Low-Dimensional Materials, Micro-Nano Devices and System, Changzhou University, Changzhou, 213164, China

2 Jiangsu Key Laboratory for Solar Cell Materials and Technolgy, Changzhou, 213164, China

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Citation and License

Nanoscale Research Letters 2012, 7:368  doi:10.1186/1556-276X-7-368

Published: 3 July 2012


The impact of various substrates and zinc oxide (ZnO) ultra thin seed layers prepared by atomic layer deposition on the geometric morphology of subsequent ZnO nanowire arrays (NWs) fabricated by the hydrothermal method was investigated. The investigated substrates included B-doped ZnO films, indium tin oxide films, single crystal silicon (111), and glass sheets. Scanning electron microscopy and X-ray diffraction measurements revealed that the geometry and aligment of the NWs were controlled by surface topography of the substrates and thickness of the ZnO seed layers, respectively. According to atomic force microscopy data, we suggest that the substrate, fluctuate amplitude and fluctuate frequency of roughness on ZnO seed layers have a great impact on the alignment of the resulting NWs, whereas the influence of the seed layers' texture was negligible.

ZnO; Seed layers; The fluctuate amplitude; Frequency of roughness