Figure 5.

Etching rate of metal particle-deposited Si wafers versus oxygen fraction in bubbling gas. HF solution was bubbled with a mixture of pure argon (Ar) and pure O2. The following marks represent the deposited metals: triangles, Ag; diamonds, Au; squares, Pt; and circles, Rh.

Yae et al. Nanoscale Research Letters 2012 7:352   doi:10.1186/1556-276X-7-352
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