|
Resolution: standard / high Figure 5.
Etching rate of metal particle-deposited Si wafers versus oxygen fraction in bubbling
gas. HF solution was bubbled with a mixture of pure argon (Ar) and pure O2. The following marks represent the deposited metals: triangles, Ag; diamonds, Au;
squares, Pt; and circles, Rh.
Yae et al. Nanoscale Research Letters 2012 7:352 doi:10.1186/1556-276X-7-352 |
