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Low-temperature poly-Si nanowire junctionless devices with gate-all-around TiN/Al2O3 stack structure using an implant-free technique

Chun-Jung Su, Tzu-I Tsai, Horng-Chih Lin*, Tiao-Yuan Huang and Tien-Sheng Chao

Nanoscale Research Letters 2012, 7:339  doi:10.1186/1556-276X-7-339

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