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Functionalized self-assembled monolayers on mesoporous silica nanoparticles with high surface coverage

Liangming Wei1*, Diwen Shi1, Zhihua Zhou2, Peiyi Ye3, Jian Wang1, Jiang Zhao1, Liyue Liu4, Changxin Chen1 and Yafei Zhang1*

Author affiliations

1 Key Laboratory for Thin Film and Microfabrication of Ministry of Education, Institute of Micro and Nano Science and Technology, Shanghai Jiao Tong University, Shanghai, 200240, China

2 State Key Laboratory of Electronic Thin Film and Integrated Devices, School of Microelectronics and Solid-state Electronics, University of Eectronic Science and Technology of China, Chengdu, 610054, China

3 School of Materials Science and Engineering, Shanghai Jiao Tong University, Shanghai, 200240, China

4 School of Chemistry and Chemical Engineering, Shanghai Jiao Tong University, Shanghai, 200240, China

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Citation and License

Nanoscale Research Letters 2012, 7:334  doi:10.1186/1556-276X-7-334

Published: 21 June 2012


Mesoporous silica nanoparticles (MSNs) containing vinyl-, propyl-, isobutyl- and phenyl functionalized monolayers were reported. These functionalized MSNs were prepared via molecular self-assembly of organosilanes on the mesoporous supports. The relative surface coverage of the organic monolayers can reach up to 100% (about 5.06 silanes/nm2). These monolayer functionalize MSNs were analyzed by a number of techniques including transmission electron microscope, fourier transform infrared spectroscopy, X-ray diffraction pattern, cross-polarized Si29 MAS NMR spectroscopy, and nitrogen sorption measurement. The main elements (i.e., the number of absorbed water, the reactivity of organosilanes, and the stereochemistry of organosilane) that greatly affected the surface coverage and the quality of the organic functionalized monolayers on MSNs were fully discussed. The results show that the proper amount of physically absorbed water, the use of high active trichlorosilanes, and the functional groups with less steric hindrance are essential to generate MSNs with high surface coverage of monolayers.