Figure 2.

SEM micrographs of Si(100) wafers etched in 0.07 M HIO3 in 3:5 ethanol/HF solutions. (a) Etch time = 300 s, 45° perspective. (b) Etch time = 900 s, plan view. (c) Etch time = 1800 s, plan view. (d) Cross section of sample shown in (b).

Kolasinski and Gogola Nanoscale Research Letters 2012 7:323   doi:10.1186/1556-276X-7-323
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