Figure 4.

Example ofin situextractions of fitting parameters and additional calculated parameters. The data show the stability of the pore etching process after a nucleation period of around 7 min. The short horizontal lines show the average of the steady state values that are used in what follows. Pores here were etched with DMF 5%(5.4%).

Ossei-Wusu et al. Nanoscale Research Letters 2012 7:320   doi:10.1186/1556-276X-7-320
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