Figure 3.

AFM images of TiO2/ZrO2/Si thin films. (a) As-deposited, (b) annealed at 573 K, (c) annealed at 773 K, and (d) annealed at 973 K.

Dong et al. Nanoscale Research Letters 2012 7:31   doi:10.1186/1556-276X-7-31
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