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Resolution: standard / high Figure 3.
AFM images of TiO2/ZrO2/Si thin films. (a) As-deposited, (b) annealed at 573 K, (c) annealed at 773 K, and (d) annealed at 973 K.
Dong et al. Nanoscale Research Letters 2012 7:31 doi:10.1186/1556-276X-7-31 |
