Figure 3.

FIB SE images of sample B and sample C. (a, b) Before ion beam sputtering and (c, d) after ion beam sputtering. The insets in figure manifest the high-magnification image of the single SiMW of each sample.

Baek et al. Nanoscale Research Letters 2012 7:29   doi:10.1186/1556-276X-7-29
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