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Resolution: standard / high Figure 12.
Transfer characteristics of the device and calculated electric field mappings around
the SWCNT channel. (a) Transfer characteristics of the FeFET memory unit with a 300-nm-SWCNT as conducting
channel. (b,c) Calculated electric field mappings around the SWCNT channel at 1 and 0.1 V gate
voltages, respectively. The red dashed line in the scale bar indicates the measured
coercive electric field of the ferroelectric film.
Liu et al. Nanoscale Research Letters 2012 7:285 doi:10.1186/1556-276X-7-285 |