Table 1

Sputtering conditions of ZnS films

Parameter

Condition


Target

ZnS (99.99% pure)

Substrate

Corning E2000 glass

RF power

120 W

Sputtering gas

Pure argon (55 sccm)

Deposition time

20 min

Sputtering pressure

3 × 10-2 Torr

Substrate temperature

100°C, 200°C, 250°C, 300°C, 350°C, 400°C

Target to substrate distance

50 mm


Hwang et al. Nanoscale Research Letters 2012 7:26   doi:10.1186/1556-276X-7-26

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