Figure 6.

Drift influence. Microchip surface (A) and influence of general xyz drift to standard matrix-based measurement process (B), iterative refinement (C) and measurement process and iterative refinement process after drift guess from the first two iterations and successive drift compensation (D).

Klapetek et al. Nanoscale Research Letters 2012 7:213   doi:10.1186/1556-276X-7-213
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