Open Access Nano Express

Immobilization of enzyme and antibody on ALD-HfO2-EIS structure by NH3 plasma treatment

I-Shun Wang1, Yi-Ting Lin2, Chi-Hsien Huang2, Tseng-Fu Lu2, Cheng-En Lue2, Polung Yang3, Dorota G Pijanswska4, Chia-Ming Yang2, Jer-Chyi Wang2,5, Jau-Song Yu3, Yu-Sun Chang3, Chien Chou1,3 and Chao-Sung Lai2,3,5*

Author Affiliations

1 Institute of Electro-Optical Engineering, Chang Gung University, 259 Wen-Hwa 1st Road, Kwei-Shan, Tao-Yuan, 333, Taiwan

2 Department of Electronic Engineering, Chang Gung University, 259 Wen-Hwa 1st Road, Kwei-Shan, Tao-Yuan, 333, Taiwan

3 Molecular Medicine Research Center, Chang Gung University, 259 Wen-Hwa 1st Road, Kwei-Shan, Tao-Yuan, 333, Taiwan

4 Nalecz Institute of Biocybernetics and Biomedical Engineering, Polish Academy of Sciences, Warsaw, 02-668, Poland

5 Biosensor Group, Biomedical Engineering Center, Chang Gung University, 259 Wen-Hwa 1st Road, Kwei-Shan, Tao-Yuan, 333, Taiwan

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Nanoscale Research Letters 2012, 7:179 doi:10.1186/1556-276X-7-179

Published: 8 March 2012

Abstract

Thin hafnium oxide layers deposited by an atomic layer deposition system were investigated as the sensing membrane of the electrolyte-insulator-semiconductor structure. Moreover, a post-remote NH3 plasma treatment was proposed to replace the complicated silanization procedure for enzyme immobilization. Compared to conventional methods using chemical procedures, remote NH3 plasma treatment reduces the processing steps and time. The results exhibited that urea and antigen can be successfully detected, which indicated that the immobilization process is correct.

Keywords:
remote plasma; silanization procedure; surface functionalization