XTEM detection on the cross-sectional microstructure of the scratched area of Si(100) surface. (a) XTEM microstructures of the scratch produced by 300 cycles of line scratch under Fn = 30 μN. The upper left inset picture shows the high-resolution microstructure of the original silicon surface. (b) High-resolution microstructure of the scratched area on the silicon surface.
Guo et al. Nanoscale Research Letters 2012 7:152 doi:10.1186/1556-276X-7-152