Figure 3.

Effect of load on the nanofabrication of Si(100) surface by scratching and post-etching. (a) AFM images of the nanostructures on the Si(100) surface after scratching at various loads. (b) AFM images of the nanostructures on the Si(100) surface after post-etching in 20 wt.% KOH + IPA solution for 40 min. (c) Cross-sectional profiles of the nanostructures before (up) and after (down) post-etching.