Figure 3.

Effect of load on the nanofabrication of Si(100) surface by scratching and post-etching. (a) AFM images of the nanostructures on the Si(100) surface after scratching at various loads. (b) AFM images of the nanostructures on the Si(100) surface after post-etching in 20 wt.% KOH + IPA solution for 40 min. (c) Cross-sectional profiles of the nanostructures before (up) and after (down) post-etching.

Guo et al. Nanoscale Research Letters 2012 7:152   doi:10.1186/1556-276X-7-152
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