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Resolution: standard / high Figure 1.
Schematic drawing showing the fabrication process by friction-induced selective etching. (a) Scratching a tip along the designed traces on the Si(100) surface, the two AFM images
show the topography of the scratched area. (b) Produced nanostructures on Si(100) surface after KOH etching.
Guo et al. Nanoscale Research Letters 2012 7:152 doi:10.1186/1556-276X-7-152 |
