Figure 4.

HRTEM (a) and EFTEM (b, c) images. SiOx/SiNy ML annealed at TA = 1,000°C, tA = 1 min by filtering the energy at SiO2 plasmon (b) and Si plasmon (c) energies, respectively.

Nalini et al. Nanoscale Research Letters 2012 7:124   doi:10.1186/1556-276X-7-124
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