Figure 1.

Schematic description of the fabrication processes. (a) Photoresist layer spin-coated on substrate, (b) UV exposure and development of the photoresist, (c) deposition of copper layer by DC sputtering, (d) removing of photoresist, and (e) growth of CuO nanowires by thermal oxidation.

Shao et al. Nanoscale Research Letters 2011 6:86   doi:10.1186/1556-276X-6-86
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