Figure 1.

Etching facets and curved cantilevers. (a) Etching facets in <110> direction obtained by underetching a single SRO/STO(001) layer. From the etching depth, a mean etching rate of 0.55 μm/min is determined. (b) Curved cantilevers fabricated from trilayers. The etching time was chosen so that only those fingers in <010> directions are completely detached.

Deneke et al. Nanoscale Research Letters 2011 6:621   doi:10.1186/1556-276X-6-621
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