Nano Express
Fabrication and ultraviolet photoresponse characteristics of ordered SnOx (x ≈ 0.87, 1.45, 2) nanopore films
1 Laboratory of Condensed Matter Spectroscopy and Opto-Electronic Physics, Department of Physics, Shanghai Jiao Tong University, Shanghai, 200240, People's Republic of China
2 School of Mechanical Engineering, Shanghai Dianji University, Shanghai 200240, People's Republic of China
3 School of Chemistry and Chemical Technology, Shanghai Jiao Tong University Shanghai, 200240, People's Republic of China
Nanoscale Research Letters 2011, 6:615 doi:10.1186/1556-276X-6-615
Published: 6 December 2011Abstract
Based on the porous anodic aluminum oxide templates, ordered SnOx nanopore films (approximately 150 nm thickness) with different x (x ≈ 0.87, 1.45, 2) have been successfully fabricated by direct current magnetron sputtering and oxidizing annealing. Due to the high specific surface area, this ordered nanopore films exhibit a great improvement in recovery time compared to thin films for ultraviolet (UV) detection. Especially, the ordered SnOx nanopore films with lower x reveal higher UV light sensitivity and shorter current recovery time, which was explained by the higher concentration of the oxygen vacancies in this SnOx films. This work presents a potential candidate material for UV light detector.
PACS: 81.15.Cd, 81.40.Ef, 81.70.Jb, 85.60.Gz.
