Gold colloidal nanoparticle electrodeposition on a silicon surface in a uniform electric field
1 CEA-Grenoble/INAC/SiNaPS-MINATEC 17 avenue des martyrs 38054 Grenoble, France
2 Université Joseph Fourier/IUT-1 17 quai C. Bernard 38000 Grenoble, France
Nanoscale Research Letters 2011, 6:580 doi:10.1186/1556-276X-6-580Published: 4 November 2011
The electrodeposition of gold colloidal nanoparticles on a silicon wafer in a uniform electric field is investigated using scanning electron microscopy and homemade electrochemical cells. Dense and uniform distributions of particles are obtained with no aggregation. The evolution of surface particle density is analyzed in relation to several parameters: applied voltage, electric field, exchanged charge. Electrical, chemical, and electrohydrodynamical parameters are taken into account in describing the electromigration process.