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Gold colloidal nanoparticle electrodeposition on a silicon surface in a uniform electric field

D Buttard12*, F Oelher1 and T David1

Author Affiliations

1 CEA-Grenoble/INAC/SiNaPS-MINATEC 17 avenue des martyrs 38054 Grenoble, France

2 Université Joseph Fourier/IUT-1 17 quai C. Bernard 38000 Grenoble, France

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Nanoscale Research Letters 2011, 6:580  doi:10.1186/1556-276X-6-580

Published: 4 November 2011


The electrodeposition of gold colloidal nanoparticles on a silicon wafer in a uniform electric field is investigated using scanning electron microscopy and homemade electrochemical cells. Dense and uniform distributions of particles are obtained with no aggregation. The evolution of surface particle density is analyzed in relation to several parameters: applied voltage, electric field, exchanged charge. Electrical, chemical, and electrohydrodynamical parameters are taken into account in describing the electromigration process.