Figure 6.

XRD of ZnO films deposited on ceramic substrates. Normalized XRD of ZnO films deposited on (a) p-type Si(100), (b) c-plane sapphire, and (c) fused quartz at substrate temperature of 330°C.

Pedersen et al. Nanoscale Research Letters 2011 6:568   doi:10.1186/1556-276X-6-568
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