Iridium wire grid polarizer fabricated using atomic layer deposition
1 Friedrich-Schiller-University Jena, Institute of Applied Physics, Max-Wien-Platz 1, 07749 Jena, Germany
2 Max-Planck-Institute of Microstructure Physics, Weinberg 2, 06120 Halle, Germany
3 Fraunhofer Institute for Applied Optics and Precision Engineering, Albert-Einstein-Straße 7, 07745 Jena, Germany
Nanoscale Research Letters 2011, 6:558 doi:10.1186/1556-276X-6-558Published: 25 October 2011
In this work, an effective multistep process toward fabrication of an iridium wire grid polarizer for UV applications involving a frequency doubling process based on ultrafast electron beam lithography and atomic layer deposition is presented. The choice of iridium as grating material is based on its good optical properties and a superior oxidation resistance. Furthermore, atomic layer deposition of iridium allows a precise adjustment of the structural parameters of the grating much better than other deposition techniques like sputtering for example. At the target wavelength of 250 nm, a transmission of about 45% and an extinction ratio of 87 are achieved.