Growth of vertically aligned ZnO nanorods using textured ZnO films
1 Centro de Innovación, Investigación y Desarrollo en Ingeniería y Tecnología de la UANL-PIIT, Apodaca, Nuevo León 66600, México
2 Facultad de Ciencias Físico-Matemáticas, Universidad Autónoma de Nuevo León, San Nicolás de los Garza, Nuevo León 66451, México
3 Centro de Investigación en Materiales Avanzados S. C., Unidad Monterrey-PIIT, Apodaca, Nuevo León 66600, México
4 Department of Materials Engineering, (DIMAT), Faculty of Engineering, University of Concepción, 270 Edmundo Larenas, Casilla 160-C, Concepción, Chile
Nanoscale Research Letters 2011, 6:524 doi:10.1186/1556-276X-6-524Published: 7 September 2011
A hydrothermal method to grow vertical-aligned ZnO nanorod arrays on ZnO films obtained by atomic layer deposition (ALD) is presented. The growth of ZnO nanorods is studied as function of the crystallographic orientation of the ZnO films deposited on silicon (100) substrates. Different thicknesses of ZnO films around 40 to 180 nm were obtained and characterized before carrying out the growth process by hydrothermal methods. A textured ZnO layer with preferential direction in the normal c-axes is formed on substrates by the decomposition of diethylzinc to provide nucleation sites for vertical nanorod growth. Crystallographic orientation of the ZnO nanorods and ZnO-ALD films was determined by X-ray diffraction analysis. Composition, morphologies, length, size, and diameter of the nanorods were studied using a scanning electron microscope and energy dispersed x-ray spectroscopy analyses. In this work, it is demonstrated that crystallinity of the ZnO-ALD films plays an important role in the vertical-aligned ZnO nanorod growth. The nanorod arrays synthesized in solution had a diameter, length, density, and orientation desirable for a potential application as photosensitive materials in the manufacture of semiconductor-polymer solar cells.
61.46.Hk, Nanocrystals; 61.46.Km, Structure of nanowires and nanorods; 81.07.Gf, Nanowires; 81.15.Gh, Chemical vapor deposition (including plasma-enhanced CVD, MOCVD, ALD, etc.)