Figure 5.

The relationship between leakage current density (Jg) and electric field (Eox) applied across the La0.35Zr0.65O2/IL (IL stands for interfacial layer) stacks for as-deposited and PDA samples. Break-down voltages (VBD) were indicated.

Zhao et al. Nanoscale Res Lett 2011 6:48   doi:10.1007/s11671-010-9782-z