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Fabrication of ultrahigh-density nanowires by electrochemical nanolithography

Feng Chen12, Hongquan Jiang2, Arnold M Kiefer2, Anna M Clausen2, Yuk-Hong Ting2, Amy E Wendt2, Bingjun Ding1 and Max G Lagally2*

Author Affiliations

1 Xi'an Jiaotong University, Xi'an, Shaanxi 710049, China

2 University of Wisconsin-Madison, Madison, WI 53706, USA

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Nanoscale Research Letters 2011, 6:444  doi:10.1186/1556-276X-6-444

Published: 11 July 2011


An approach has been developed to produce silver nanoparticles (AgNPs) rapidly on semiconductor wafers using electrochemical deposition. The closely packed AgNPs have a density of up to 1.4 × 1011 cm-2 with good size uniformity. AgNPs retain their shape and position on the substrate when used as nanomasks for producing ultrahigh-density vertical nanowire arrays with controllable size, making it a one-step nanolithography technique. We demonstrate this method on Si/SiGe multilayer superlattices using electrochemical nanopatterning and plasma etching to obtain high-density Si/SiGe multilayer superlattice nanowires.