Figure 2.

HR-SEM images of the resist and HfO2 patterns. Plan view images of (a) the resist pattern after laser interference nanolithography and (b) the resulting HfO2 nanopattern after CF4/O2 ICP-RIE and HCl/H2O cleaning.

Benedicto et al. Nanoscale Research Letters 2011 6:400   doi:10.1186/1556-276X-6-400
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