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Fabrication of HfO2 patterns by laser interference nanolithography and selective dry etching for III-V CMOS application

Marcos Benedicto, Beatriz Galiana, Jon M Molina-Aldareguia, Scott Monaghan, Paul K Hurley, Karim Cherkaoui, Luis Vazquez and Paloma Tejedor*

Nanoscale Research Letters 2011, 6:400  doi:10.1186/1556-276X-6-400

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