Figure 2.

Schematic of processing for graphene. In first step, graphene is transferred on to suitable substrates and Ni etch mask is created on it in second step. Plasma etching and removal of Ni produced patterned graphene, which is then contacted in the last step using standard liftoff process.

Kumar et al. Nanoscale Research Letters 2011 6:390   doi:10.1186/1556-276X-6-390
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