Figure 7.

EDXS of film deposited on a Si substrate. The ratio of concentrations is (0.5InN/0.5In2O3) (a), and (0.3InN/0.7In2O3) (b) for 3 and 6 months exposure at ambient conditions, respectively.

Sarantopoulou et al. Nanoscale Research Letters 2011 6:387   doi:10.1186/1556-276X-6-387
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