Figure 1.

XRD spectra of VO2 films deposited by (a1-a3, b4-b6) DC and (c7-c10) pulsed-DC sputtering, doped with different dopant element and contents: (a1) pure VO2, (a2) V0.97W0.03O2, and (a3) V0.95W0.05O2; (b4) V0.97Mo0.03O2, (b5) V0.94Mo0.06O2, and (b6) V0.89Mo0.11O2; (c7) pure VO2, (c8) V0.96Nb0.04O2, (c9) V0.93Nb0.07O2, and (c10) V0.89Nb0.11O2.

Batista et al. Nanoscale Research Letters 2011 6:301   doi:10.1186/1556-276X-6-301
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