Figure 1.

Schematic illustration for the fabrication of ordered pit-pattern. (a) Closed-packed PS single ML pattern. (b) PS pattern after O2 RIE. (c) Au film deposition. (d) Removing PS pattern in THF. (e) KOH selective etching. (f) Inverted pyramid-like pits pattern with {111} facets after Au was removed. The panels at the right side show the AFM images at corresponding stages.

Ma et al. Nanoscale Research Letters 2011 6:205   doi:10.1186/1556-276X-6-205
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