Figure 2.

SEM images of nanopattern from NIL results on the SiO2/Si substrates including a square lattice of circular pillars of 300 nm diameter with a 200 nm pitch. before (a) and after (b) reactive ion etching, lines of 300 nm width with a pitch of 200 nm before (c) and after (d) reactive ion etching.

Jung and Lee Nanoscale Research Letters 2011 6:159   doi:10.1186/1556-276X-6-159
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