Figure 5.

AFM and SEM images of Al prepattern and AAO (a, b) Al prepattern featuring a second grating on a primary structure with ~85° rotation and pitch of 277 nm. (c, d) prepattern-induced regular AAO array. Anodization conducted in 0.3 M H3PO4 at 110 V and 5°C.

Lai et al. Nanoscale Research Letters 2011 6:157   doi:10.1186/1556-276X-6-157
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