Figure 4.

AFM and SEM images of Al prepattern and AAO (a) 2D Al prepatten after RD-WETS. (b, c) 2D prepattern-induced regular AAO array. Anodization conducted in 0.3 M H3PO4 at 110 V and 5°C.

Lai et al. Nanoscale Research Letters 2011 6:157   doi:10.1186/1556-276X-6-157
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