Schematic representations. Schematic representations of an untreated HEMT device (a) and of a HEMT subjected to CHF3 plasma processing (b). IDS-VDS characteristics of HEMT device not subjected to the plasma treatment (squares) and subjected to the plasma treatment and to an annealing (triangles).
Greco et al. Nanoscale Research Letters 2011 6:132 doi:10.1186/1556-276X-6-132