Open Access Nano Express

Nanogrids and Beehive-Like Nanostructures Formed by Plasma Etching the Self-Organized SiGe Islands

Yuan-Ming Chang1, Sheng-Rui Jian1* and Jenh-Yih Juang2

Author Affiliations

1 Department of Materials Science and Engineering, I-Shou University, Kaohsiung, 840, Taiwan

2 Department of Electrophysics, National Chiao Tung University, Hsinchu, 300, Taiwan

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Nanoscale Research Letters 2010, 5:1456-1463  doi:10.1007/s11671-010-9661-7

Published: 8 June 2010

Abstract

A lithography-free method for fabricating the nanogrids and quasi-beehive nanostructures on Si substrates is developed. It combines sequential treatments of thermal annealing with reactive ion etching (RIE) on SiGe thin films grown on (100)-Si substrates. The SiGe thin films deposited by ultrahigh vacuum chemical vapor deposition form self-assembled nanoislands via the strain-induced surface roughening (Asaro-Tiller-Grinfeld instability) during thermal annealing, which, in turn, serve as patterned sacrifice regions for subsequent RIE process carried out for fabricating nanogrids and beehive-like nanostructures on Si substrates. The scanning electron microscopy and atomic force microscopy observations confirmed that the resultant pattern of the obtained structures can be manipulated by tuning the treatment conditions, suggesting an interesting alternative route of producing self-organized nanostructures.

Keywords:
SiGe; High-resolution reciprocal space mapping; SEM; AFM; TEM