Figure S1.

Figure S1 SEM images of products obtained by etching the preformed ZnO nanorods array in ammonia solution (0.5 wt%) with different etching time: (a) 0 hr, (b) 1 hr, (c) 2 hrs, and (d) 3.5 hrs. From this result, we can see that without using the surfactant of CTAB, the ZnO nanorods become shorter and shorter in the etching process, always with shallow pits at the top end, and finally etch into broken pieces

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Wang et al. Nanoscale Research Letters 2010 5:1102-1106   doi:10.1007/s11671-010-9608-z