Figure 3.
O K edge for mixed phase 900°C annealed t-/m-HfO2 films as a function of film thickness
Lucovsky and Phillips Nanoscale Research Letters 2010 5:550 doi:10.1007/s11671-009-9520-6 |
Figure 3.
O K edge for mixed phase 900°C annealed t-/m-HfO2 films as a function of film thickness
Lucovsky and Phillips Nanoscale Research Letters 2010 5:550 doi:10.1007/s11671-009-9520-6 |
