Figure 1.

SEM photographs of samples with a constant TiN thickness of 100 nm and varying Ni thickness (first column) after the H2 plasma pretreatment at 4 Torr, 900 W (second column) after 2-min growth at 5 Torr, 900 W and (third column) after 20-min growth at 5 Torr, 900 W

Kpetsu et al. Nanoscale Research Letters 2010 5:539-544   doi:10.1007/s11671-010-9544-y