Figure 1.
SEM photographs of samples with a constant TiN thickness of 100 nm and varying Ni
thickness (first column) after the H2 plasma pretreatment at 4 Torr, 900 W (second column) after 2-min growth at 5 Torr,
900 W and (third column) after 20-min growth at 5 Torr, 900 W
Kpetsu et al. Nanoscale Research Letters 2010 5:539 doi:10.1007/s11671-010-9544-y |
