Open Access Nano Express

3D Simulation of Nano-Imprint Lithography

JoseManuelRomán Marín1, HenrikKoblitz Rasmussen1* and Ole Hassager2

Author Affiliations

1 Department of Mechanical Engineering, Technical University of Denmark, 2800, Lyngby, Denmark

2 Department of Chemical and Biochemical Engineering, Technical University of Denmark, 2800, Lyngby, Denmark

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Nanoscale Research Letters 2009, 5:274-278  doi:10.1007/s11671-009-9475-7

Published: 13 November 2009

Abstract

A proof of concept study of the feasibility of fully three-dimensional (3D) time-dependent simulation of nano-imprint lithography of polymer melt, where the polymer is treated as a structured liquid, has been presented. Considering the flow physics of the polymer as a structured liquid, we have followed the line initiated by de Gennes, using a Molecular Stress Function model of the Doi and Edwards type. We have used a 3D Lagrangian Galerkin finite element methods implemented on a parallel computer architecture. In a Lagrangian techniques, the node point follows the particle movement, allowing for the movement of free surfaces or interfaces. We have extended the method to handle the dynamic movement of the contact line between the polymer melt and stamp during mold filling.

Keywords:
NIL; Nano-imprint; Finite element; Lagrangian; Viscoelastic; MSF