Figure 2.
Schematic illustration of the stripe geometry a as well as of the corresponding RHEED patterns b developed during buffer growth. Due to the {11n} sidewall facettation of the stripes with an inclination α relative to the in plane
[110] direction, facet spots appear in the RHEED patterns that are tilted by α with
respect to the specular spot
Sanduijav et al. Nanoscale Research Letters 2010 5:1935 doi:10.1007/s11671-010-9814-8 |
