Figure 1.
SEM and TEM images of the variable morphology of porous SiNWs etched with different
H2O2 concentrations. a–c 0.1 M H2O2, d–f 0.2 M H2O2, g–i 0.3 M H2O2, j–l 0.4 M H2O2, m–o 0.5 M H2O2. The SAD pattern is shown in the inset (o)
Lin et al. Nanoscale Research Letters 2010 5:1822 doi:10.1007/s11671-010-9719-6 |