Figure 5.

a Schematic diagram of the same cell as in Fig. 4 after H3PO4 etching. Local Al shunts are removed. b The corresponding dark IV curve showing rectifying behaviour and a large shunt resistance (Rsh = 2 × 105 Ω)

Di et al. Nanoscale Research Letters 2010 5:1762-1767   doi:10.1007/s11671-010-9707-x