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An Antireflective Nanostructure Array Fabricated by Nanosilver Colloidal Lithography on a Silicon Substrate

Seong-Je Park, Soon-Won Lee, Ki-Joong Lee, Ji-Hye Lee, Ki-Don Kim, Jun-Ho Jeong and Jun-Hyuk Choi*

Author Affiliations

Department of Nanomechanical System, Korea Institute of Machinery and Materials, 171 Jang-dong, Yuseung-gu, Daejeon, Republic of Korea

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Nanoscale Research Letters 2010, 5:1570-1577  doi:10.1007/s11671-010-9678-y

Published: 14 July 2010


An alternative method is presented for fabricating an antireflective nanostructure array using nanosilver colloidal lithography. Spin coating was used to produce the multilayered silver nanoparticles, which grew by self-assembly and were transformed into randomly distributed nanosilver islands through the thermodynamic action of dewetting and Oswald ripening. The average size and coverage rate of the islands increased with concentration in the range of 50–90 nm and 40–65%, respectively. The nanosilver islands were critically affected by concentration and spin speed. The effects of these two parameters were investigated, after etching and wet removal of nanosilver residues. The reflection nearly disappeared in the ultraviolet wavelength range and was 17% of the reflection of a bare silicon wafer in the visible range.

Antireflective; Nanosilver; Nanostructure; Nanoislands; Colloidal lithography