SpringerOpen Newsletter

Receive periodic news and updates relating to SpringerOpen.

Open Access Email this article to a friend

A Novel Method to Fabricate Silicon Nanowire pn Junctions by a Combination of Ion Implantation and in-situ Doping

PratyushDas Kanungo*, Reinhard Kögler, Peter Werner, Ulrich Gösele and Wolfgang Skorupa

Nanoscale Research Letters 2009, 5:243-246  doi:10.1007/s11671-009-9472-x

Fields marked * are required


Multiple email addresses should be separated with commas or semicolons.
How can I ensure that I receive Nanoscale Research Letters's emails?