Facile Fabrication of Ultrafine Hollow Silica and Magnetic Hollow Silica Nanoparticles by a Dual-Templating Approach
1 Key Laboratory of Acoustic and Photonic Materials and Devices of Ministry of Education, Wuhan University, 430072, Wuhan, People’s Republic of China
2 Center for Electronic Microscopy and Department of Physics, Wuhan University, 430072, Wuhan, People’s Republic of China
3 School of Materials and Metallurgy, Wuhan University of Science and Technology, 430081, Wuhan, People’s Republic of China
Citation and License
Nanoscale Research Letters 2009, 5:116-123 doi:10.1007/s11671-009-9452-1Published: 10 October 2009
The development of synthetic process for hollow silica materials is an issue of considerable topical interest. While a number of chemical routes are available and are extensively used, the diameter of hollow silica often large than 50 nm. Here, we report on a facial route to synthesis ultrafine hollow silica nanoparticles (the diameter of ca. 24 nm) with high surface area by using cetyltrimethylammmonium bromide (CTAB) and sodium bis(2-ethylhexyl) sulfosuccinate (AOT) as co-templates and subsequent annealing treatment. When the hollow magnetite nanoparticles were introduced into the reaction, the ultrafine magnetic hollow silica nanoparticles with the diameter of ca. 32 nm were obtained correspondingly. Transmission electron microscopy studies confirm that the nanoparticles are composed of amorphous silica and that the majority of them are hollow.