Figure 1.

Fabrication of tantalum-based nanodot arrays using AAO processing.aSchematic representation of fabrication procedure.bSEM images of the fabricated nanodot arrays.cAFM images of the fabricated nanodot arrays. Images are arranged from left to right: unprocessed silicon (Si), 10-nm nanodot array (10 nm), 50-nm nanodot array (50 nm), 100-nm nanodot array (100 nm), and 200-nm nanodot array (200 nm)

Pan et al. Nanoscale Research Letters 2009 4:903-912   doi:10.1007/s11671-009-9333-7