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Binary Mixtures of SH- and CH3-Terminated Self-Assembled Monolayers to Control the Average Spacing Between Aligned Gold Nanoparticles

Asad Rezaee1, Laura C Pavelka2 and Silvia Mittler1*

Author Affiliations

1 Department of Physics and Astronomy, The University of Western Ontario, London, ON, N6A 3K7, Canada

2 Department of Chemistry, The University of Western Ontario, London, ON, N6A 5B7, Canada

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Nanoscale Research Letters 2009, 4:1319-1323  doi:10.1007/s11671-009-9399-2

Published: 2 August 2009


This paper presents a method to control the average spacing between organometallic chemical vapor deposition (OMCVD) grown gold nanoparticles (Au NPs) in a line. Focused ion beam patterned CH3-terminated self-assembled monolayers are refilled systematically with different mixtures of SH- and CH3-terminated silanes. The average spacing between OMCVD Au NPs is demonstrated systematically to decrease by increasing the v/v% ratio of the thiols in the binary silane mixtures with SH- and CH3-terminated groups.

Average spacing; FIB; Gold; Nanoparticle; OMCVD; Self-assembly