Binary Mixtures of SH- and CH3-Terminated Self-Assembled Monolayers to Control the Average Spacing Between Aligned Gold Nanoparticles
1 Department of Physics and Astronomy, The University of Western Ontario, London, ON, N6A 3K7, Canada
2 Department of Chemistry, The University of Western Ontario, London, ON, N6A 5B7, Canada
Nanoscale Research Letters 2009, 4:1319-1323 doi:10.1007/s11671-009-9399-2Published: 2 August 2009
This paper presents a method to control the average spacing between organometallic chemical vapor deposition (OMCVD) grown gold nanoparticles (Au NPs) in a line. Focused ion beam patterned CH3-terminated self-assembled monolayers are refilled systematically with different mixtures of SH- and CH3-terminated silanes. The average spacing between OMCVD Au NPs is demonstrated systematically to decrease by increasing the v/v% ratio of the thiols in the binary silane mixtures with SH- and CH3-terminated groups.