Figure 2.

The X-TEM images of glass/Ta(30 Å)/NiFe(50 Å)/IrMn(90 Å)/Ta(100 Å) samples under three different deposition conditions:adeposited at RT only,bdeposited at RT with an external fieldh = 500 Oe, andcthe same film-growth procedure as in (b), post-annealing atTA = 250 °C withhon for 1 h, and then field-cooling to RT

Chen Nanoscale Research Letters 2008 4:90-93   doi:10.1007/s11671-008-9207-4